Surface Engineering, Vol. 33, No. 8

Surface Engineering Division
17 May 2017

Surface Engineering, Vol. 33, No. 8, 03 Aug 2017 is now available online. IOM3 members have free access to the papers below via our journals page.


Synthesis and characterisation of tin sulphide thin films

Kenza Kamli, Zakaria Hadef, Baghdadi Chouial, Beddiaf Zaidi, Bouzid Hadjoudja & Allaoua Chibani

Pages: 567-572

DOI: 10.1080/02670844.2016.1271593


Effect of CVD carbon coatings on properties of SiC fibres

S. Y. Cao, J. Wang & H. Wang

Pages: 573-577

DOI: 10.1080/02670844.2015.1123346


Effects of Ti target current on properties of TiSiN coatings

S. Li, J. Deng, X. Qin & C. Ji

Pages: 578-584

DOI: 10.1080/02670844.2015.1125408


The structure and mechanical properties of magnetron sputtered VSiN  coatings

Hongjian Zhao, Zenglei Ni & Fuxing Ye

Pages: 585-591

DOI: 10.1080/02670844.2016.1139027


Bias effects on AlMgB thin films prepared by magnetron sputtering

S. Jing, Y. Bai, F. Qin & J. Xiao

Pages: 592-596

DOI: 10.1080/02670844.2016.1143213


Performance evaluation of PVD coatings due to sequential indentation tests

X. Zha, N. Wang, F. Jiang & X. Xu

Pages: 597-604

DOI: 10.1080/02670844.2016.1161947


Microstructure and multifunctional properties of Ti–Si–B–C coatings by plasma-enhanced chemical vapour deposition

J. H. Shin, W. J. Lim & K. H. Kim

Pages: 605-611

DOI: 10.1080/02670844.2016.1184472


Compositionally gradient PVD CrAlSiN films: structural examination and oxidation resistance

D. Chaliampalias, N. Pliatsikas, E. Pavlidou, K. Kolaklieva, R. Kakanakov, N. Vouroutzis, P. Patsalas, E. K. Polychroniadis, K. Chrissafis & G. Vourlias

Pages: 612-618

DOI: 10.1080/02670844.2016.1187789


Effect of Ti content on structure and mechanical properties of Cr–Ti–N films

X. Feng, H. Zhou, Z. Wan & K. Zhang

Pages: 619-625

DOI: 10.1080/02670844.2016.1212531


Influence of yttrium addition on reactive sputtered W–Y–N coatings

F. Ye, L. Zhao, C. Mu & H. Zhao

Pages: 626-632

DOI: 10.1080/02670844.2016.1231758


Characterisation of amorphous/nanocrystalline multilayer Si3N4–Si3N4/Si2N2O films prepared by alternately sputtering

Eryong Liu, Jibin Pu, Zhixiang Zeng, Yongxin Wang & Wenjie Zhao

Pages: 633-641

DOI: 10.1080/02670844.2017.1292704


Reactive close field unbalance magnetron sputter deposition of titanium dioxides for potential photovoltaic applications

Z. Zhang & G. Shao

Pages: 642-647

DOI: 10.1080/02670844.2016.1179022