Breaking Barriers for Physical Vapour Deposition Technology by High Power Impulse Magnetron Sputtering

24 Jan 2018

East Midlands Materials Society Technical Meeting


Prof Arutiun P. Ehiasarian - Sheffield Hallam University 


Physical Vapour Deposition (PVD) is used in a wide range of strategic applications including aerospace, automotive, biomedical, architectural glazing, display and semi-resilience and mechanical robustness of the coating. The complexity of the coating chemistry has grown to meet the tightening industrial specifications and competition.

High Power Impulse Magnetron Sputtering is the latest innovation in PVD technology. It uses megawatt pulsed plasmas to produce a highly energetic coating environment which, when appropriately controlled, gives a great freedom of process design. The adhesion of coatings can be improved through metal ion bombardment of the substrate.

The density of coatings can approach that of bulk matter. Crystallographic texture and grain size can be tailored through the degree of plasma activation. Complex chemistry coatings have been developed to improve hot corrosion in aeroplane components, wear of orthopaedic implants and efficiency of space satellite cryogenic coolers. Technology through semi-conductor through silicon via metallisation has been introduced to market. Transparent conducting oxides and metal contact layers for solar cells have been demonstrated.

The talk will focus on the scientific principles underlying of these applications.

Download Poster (pdf 121 KB) with full details

All welcome



6.30pm - refreshments

7.00pm - talk



The Pope Building is Building 27 on the university map. Ample parking close by.




Venue and booking

Event Location: 
Nottingham University
Room C15, Pope Building
United Kingdom
Contact details: 

 Katy Voisey

tel. 07958 306963

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